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Overview

Owen Meilander is a fifth-year Ph.D. student in the Interdisciplinary Material Science program who does his research in Prof. Mona Ebrish's Electron Device Group. His research interests include the fabrication of high-efficiency and high-power gallium nitride devices with a focus on the release and transfer of devices to heterogeneously integrate with CMOS electronics.

Owen is passionate about science outreach in the VINSE cleanroom. He has lectured and led stations for the microfluidics and solar cell high school outreach programs.

Additionally, as a VINSE superuser, Owen trains users on photolithography methods such as spin-coating and development in conjunction with the Karl Suss MA6 mask aligner and Heidelberg uMLA along with soft lithography processing. Additionally, he trains on etching instruments including the Oxford PlasmaPro 100 Cobra ICP-RIE, Trion Minilock RIE, PVA TePla plasma cleaner, Harrick plasma cleaner, and the XeF2 vapor etcher. He also manages training on analytical tools within the cleanroom including the JA Woollam spectroscopic ellipsometer, KLA stylus profilometer, electrical probe station, and Ossila four-point probe. Finally, he trains on the Disco DAD 3220 dicing saw and the Picosun R200 Advanced atomic layer deposition system.