Overview
The Heidelberg Instruments 渭PG 101 laser writer is a versatile micro pattern generation tool for direct writing/maskless lithography and low volume mask making of chrome-glass photolithography masks.聽 The tool is compatible with a wide range of sample sizes, sample materials, and photoresists.聽 The chrome-glass masks are compatible with the VINSE Karl Suss MA-6 mask aligner.聽 All masks are printed by VINSE Cleanroom Staff unless otherwise specified.
Capabilities
- Minimum feature size:
- Line in space: 2 渭m
- Space between lines: 2 渭m
- Line array: 2 渭m
- Point in space: 4 渭m
- Sample size: 1 cm x 1 cm to 13 cm x 13 cm
- Sample types: recipes developed for silicon and glass, discuss other sample material with VINSE cleanroom staff
- Pattern size: 10 渭m x 10 渭m to 10 cm x 10 cm
- Pattern write time dependent on pattern size and photoresist used
- Chrome glass masks
- Mask size: 5 inch x 5 inch, mask blanks supplied by VINSE
- Dark field and bright field masks available
- Printed by VINSE Cleanroom Staff
- Supported photoresists:
- AZ 1518
- Shipley S1805
- Shipley 1813
- mr-DWL-40
- SPR 220 4.5
- SPR 220 7.0
- Automated and manual focusing options
- Focal depth: 6 渭m
- Automated edge detection, structure detection, and manual alignment for multilayer patterns
- Input file types: gds, dxf, bmp, cif, or gbr
- Light source: 405 nm laser (class 1 in tool enclosure)
Contact
-
VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building